chemical physics of discharges - Argonne National Laboratory
chemical physics of discharges - Argonne National Laboratory chemical physics of discharges - Argonne National Laboratory
160 Group I11 compounds. No in estigations have been made on the compounds of boron. Ywkovskii t& &.' reported in 1958 that BC1 was reduced to elemental boron by H atoms, and the present work on alum?nium halides supports this claim. When inert csrrier gases were used there was a very limited deposition of metal from Al and Sc halides amounting to onu a few per cent of the vapour passed through the discharge, but when hydmgen wee employed much higher yields of metals were obtained. It would appear, therefore, that at least one step in the decomposition involves a H atom reaction, and the process may well be, for AlCl :- initial dissociation of UC~ to uc13 : H atom reduction of UC~, to UCI : disproportionation 03 fic1 to U and fic13. A maas spectromet+c examination of the species present in the discharge revealed AN1 In readily detectable quantities but no AlCl was observed. Yields of up to 55% Al metal have been obtained from Ab1 in a single pees through 3 a 2450 mC plasma, and if a second discharge was produced downstreem more Al deposited. The rate at which AlCl decomposes, with comparatively low power, and with ita intenae blue plama makes this reaction one of the most spectacular of those studied. The relatively involatile AlF3 also dissociated quite readily to glve the metal, although it is not easily handled in the experimental 8pparatUe described. The chloride and fluoride of ecandiun behaved in a similar manner to the corresponding aluminium compounds. NCl also dissociated readily in the lower frequency apparatus. It should be Lntioned here that the chief difference between the wavesuide and the coil-coupled apparatus appear8 to be that in the formar the electrons are accelerated to higher energlea since the electrostatic field is concentrated between the resonator walls where a high potential gradient exists in a direction axial to the discharge tube. By comparison the E field in a coil is much more randomly distributed. Rare Earth Comounda. We have not as yet had an opportunity of studying these halides systematically, but preliminary erperiments have shorn that they behave in a menner similar to AlCl That is, there is only limited dissociation to metal in an inert c&ier gas, but with hydroem satlafactory yields of metals are obtained. Thae Ce and Le result from &F3, CeC13, LaB and LaC13. If, for example, chlorides contsirr ing appreciable quautjties of oxychloride are used for the dirsooiation this inpurity is left in the sample boat and a highly pure metal is deposited. Such reactions may therefore prove of use in the preparation of certain metalm. 2. Markovakii, L. V., Lvova, V. I., Kondrashev, Y. D., PO Bora i Ego Sveedin, 36 (1958). Ber. Tr. KO&. 1 i
I 161 THE GLOW DISCHARGE DEPOSITION OF BORON A. E Hultquist and M. E. Sibert Materials Sciences Laboratory Lockheed Palo Alto Research Laboratory Palo Alto, California INTRODUCTION Many ncw materials concepts are evolving out of aerospace materials technology. One of ' the most promising of these is that of boron filament-reinforced composite structures. Incorporation of continuous boron filament in a suitable matrix could yield a structure with ' the strength of high-strength steel, the rigidity of beryllium, and the density of magnesium. A large-scale development effort is currently concerned with fabrication of such structures. , Once this has been achieved, large amounts of filament must be made available at reason- able cost to make large-scale usage practical. Present techniques for filament production ' are based on scaled-up laboratory chemical vapor deposition procedures, and major tech- nological development is required to result in large-scale production. As a result, many i other new and novel techniques for filament preparation have been investigated with the , intent of developing alternate approaches. This study is concerned with investigation of one such approach, that of deposition in an electrodeless glow discharge. Basically a high-voltage, low-amperage, high-frequency rf currcnl is imposed across a boron-containing gas, resulting in a high degree of ionization/ ' activation of the ions present. Boron then deposits out in elemental form on all surfaces within the glow discharge area. Use of proper deposition conditions confines the glow largcly to the filament substrate. By passage of the filamentary substrate continuously ' through the discharge, the approach is potentially capable of high rate filament formation with excellent uniformity and reliability. Variation of current input can result in deposi- L. tion at any point from room temperature up to 800- 1000°C. Both metallic and non- , metallic substrates can be employed. Deposition is achieved at low pressures of the order of a few mm. reaction of boron trichloride and hydrogen in a glow discharge. However, efforts to dupli- cate this work indicate that the conditione employed lead to effects more like an arc than a glow discharge. Related, although distinctly thermally rather than electrically initiated I
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I<br />
161<br />
THE GLOW DISCHARGE DEPOSITION OF BORON<br />
A. E Hultquist and M. E. Sibert<br />
Materials Sciences <strong>Laboratory</strong><br />
Lockheed Palo Alto Research <strong>Laboratory</strong><br />
Palo Alto, California<br />
INTRODUCTION<br />
Many ncw materials concepts are evolving out <strong>of</strong> aerospace materials technology. One <strong>of</strong><br />
' the most promising <strong>of</strong> these is that <strong>of</strong> boron filament-reinforced composite structures.<br />
Incorporation <strong>of</strong> continuous boron filament in a suitable matrix could yield a structure with<br />
' the strength <strong>of</strong> high-strength steel, the rigidity <strong>of</strong> beryllium, and the density <strong>of</strong> magnesium.<br />
A large-scale development effort is currently concerned with fabrication <strong>of</strong> such structures.<br />
, Once this has been achieved, large amounts <strong>of</strong> filament must be made available at reason-<br />
able cost to make large-scale usage practical. Present techniques for filament production<br />
' are based on scaled-up laboratory <strong>chemical</strong> vapor deposition procedures, and major tech-<br />
nological development is required to result in large-scale production. As a result, many<br />
i other new and novel techniques for filament preparation have been investigated with the<br />
, intent <strong>of</strong> developing alternate approaches.<br />
This study is concerned with investigation <strong>of</strong> one such approach, that <strong>of</strong> deposition in an<br />
electrodeless glow discharge. Basically a high-voltage, low-amperage, high-frequency rf<br />
currcnl is imposed across a boron-containing gas, resulting in a high degree <strong>of</strong> ionization/<br />
' activation <strong>of</strong> the ions present. Boron then deposits out in elemental form on all surfaces<br />
within the glow discharge area. Use <strong>of</strong> proper deposition conditions confines the glow<br />
largcly to the filament substrate. By passage <strong>of</strong> the filamentary substrate continuously<br />
' through the discharge, the approach is potentially capable <strong>of</strong> high rate filament formation<br />
with excellent uniformity and reliability. Variation <strong>of</strong> current input can result in deposi-<br />
L. tion at any point from room temperature up to 800- 1000°C.<br />
Both metallic and non-<br />
, metallic substrates can be employed. Deposition is achieved at low pressures <strong>of</strong> the order<br />
<strong>of</strong> a few mm.<br />
reaction <strong>of</strong> boron trichloride and hydrogen in a glow discharge. However, efforts to dupli-<br />
cate this work indicate that the conditione employed lead to effects more like an arc than<br />
a glow discharge. Related, although distinctly thermally rather than electrically initiated<br />
I