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Programm Photovoltaik Ausgabe 2009 ... - Bundesamt für Energie BFE

Programm Photovoltaik Ausgabe 2009 ... - Bundesamt für Energie BFE

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2. Processes<br />

2.1. Microcrystalline process at high deposition rate and control tools [Fel08, Fel08 b, Bug08]<br />

Introducing a reduction of the KAI-M inter-electrode gap distance allowed us to explore higher pressure<br />

regime. A basic description of the various plasma regimes and the relation to the reactor configuration<br />

are given in [Fel08, Fel08 b, Bug08]. As a result of these hardware and process optimization<br />

steps, a microcrystalline single junction solar cell (0.25 cm2) with an efficiency of 7.1% (Voc=503 mV,<br />

FF=70.0%, Jsc=20.2 mA/cm2, Fig.7) was obtained at a deposition rate of 1 nm/s. This deposition rate<br />

is significantly higher than the usual 0.4-0.55 nm/s which was achieved in previous projects.<br />

Further optimization is under way to increase the efficiency; in order to better understand the variation<br />

in efficiency observed for different deposition rates (usually a decrease of efficiency), the quality of the<br />

�c-Si:H material in the single-junction cells was checked with Fourier Transform Photocurrent Spectroscopy<br />

(FTPS). Absorption spectra are presented in Fig.7b for both high and low silane depletion<br />

regimes. Residual defects are observed, for instance, in the i-layer of the cell deposited at high deposition<br />

rates in high depletion regimes.<br />

In order to better understand the plasma processes, in particular the depletion and the onset of powder<br />

formation, several tools have been developed in 2008. These will be implemented for various<br />

measurements in <strong>2009</strong>.<br />

a) b)<br />

Fig.7: a) Initial I-V characteristics of �c-Si:H single-junction solar cell deposited under high silane<br />

concentration regime at 1 nm/s. The cell thickness is 1.2 �m<br />

b) Defect densities in two different regimes measured by FTPS<br />

2.2 UV-NIL replication process for nano-textured substrates<br />

During the last reporting period, a new replication system has been developed and installed to fabricate<br />

laboratory scale nano-textured substrates directly at the IMT (see Fig.8). Both substrates and<br />

superstrate configuration are possible.<br />

Fig.8: Photos of the membrane REPLICATION SYSTEM<br />

Fig.9: Example of a SEM images of a LPCVD master (left) and the replica (right).<br />

36/290<br />

New processes and device structures for the fabrication of high efficiency thin film silicon photovoltaic modules, C. Ballif, University of Neuchâtel<br />

6/16

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