23.03.2013 Views

Damage formation and annealing studies of low energy ion implants ...

Damage formation and annealing studies of low energy ion implants ...

Damage formation and annealing studies of low energy ion implants ...

SHOW MORE
SHOW LESS

You also want an ePaper? Increase the reach of your titles

YUMPU automatically turns print PDFs into web optimized ePapers that Google loves.

List <strong>of</strong> Figures<br />

Figure 1.1 a) Schematic <strong>of</strong> a MOS transistor. b) XTEM image <strong>of</strong> an AMD<br />

optimised transistor with a gate length <strong>of</strong> 35 nm.<br />

Figure 1.2 Number <strong>of</strong> transistors on Intel Microprocessors.<br />

Figure 1.3 Roadmap for device shrinkage at AMD with XTEM <strong>of</strong> test structures.<br />

Figure 2.1 Scattering into a solid angle.<br />

Figure 2.2 Elastic scattering configurat<strong>ion</strong>.<br />

Figure 2.3 Electronic stopping powers for H <strong>and</strong> He <strong>ion</strong>s in Si. The posit<strong>ion</strong>s<br />

corresponding to the Thomas Fermi velocity are indicated, along with the<br />

<strong>energy</strong> regimes where different models for the stopping powers are<br />

applicable.<br />

Figure 2.4 Electronic <strong>and</strong> Nuclear stopping powers for He <strong>and</strong> As in Si. The <strong>energy</strong><br />

regimes used in MEIS <strong>and</strong> for the <strong>implants</strong> are indicated.<br />

Figure 2.5 Results <strong>of</strong> TRIM simulat<strong>ion</strong>s showing the trajectories <strong>of</strong> 20 a) 3 keV As<br />

<strong>ion</strong>s <strong>and</strong> b) 3 keV B <strong>ion</strong>s, implanted into Si.<br />

Figure 3.1 Si unit cell.<br />

Figure 3.2 Si (100), (110) <strong>and</strong> (111) planes.<br />

Figure 3.3 Schematic <strong>of</strong> different defect types, i.e. a) vacancy, b) di-vacancy, c) self<br />

interstitial, d) interstitialcy, e) impurity interstitial, f) substitut<strong>ion</strong>al<br />

impurity, g) impurity vacancy pair, h) impurity self interstitial pair.<br />

Figure 3.4 Structure <strong>of</strong> crystalline Si (left) showing the 6 ring structure <strong>and</strong><br />

amorphous Si (right) where the 5 <strong>and</strong> 7 ring structure is visible.<br />

Figure 3.5 Illustrat<strong>ion</strong> <strong>of</strong> locat<strong>ion</strong> <strong>of</strong> damage formed by a) heavy <strong>and</strong> b) light <strong>ion</strong>s<br />

Figure 3.6 SPER rates for Si (100), (110) <strong>and</strong> (111).<br />

Figure 3.7 Schematic representat<strong>ion</strong> <strong>of</strong> SPER <strong>of</strong> Si(100) in terms <strong>of</strong> kink (BB’)<br />

generat<strong>ion</strong> <strong>and</strong> mot<strong>ion</strong> along [110] ledges (AA’).<br />

Figure 3.8 The relat<strong>ion</strong>ship between the damage density distribut<strong>ion</strong> (solid lines)<br />

<strong>and</strong> amorphisat<strong>ion</strong> threshold (dashed line) leading to the different<br />

categories <strong>of</strong> defect.<br />

Figure 3.9 TEM images <strong>of</strong> defects present in the EOR damage area <strong>of</strong> <strong>ion</strong> implanted<br />

Si. These are clusters, {113}s, PDLs, <strong>and</strong> FDLs.<br />

Figure 3.10 Structure <strong>of</strong> a) faulted dislocat<strong>ion</strong> loops <strong>and</strong> b) perfect dislocat<strong>ion</strong> loops.<br />

Faulted dislocat<strong>ion</strong> loops contain a {111} stacking fault.<br />

vii

Hooray! Your file is uploaded and ready to be published.

Saved successfully!

Ooh no, something went wrong!