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Damage formation and annealing studies of low energy ion implants ...

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nearest neighbour distance (52). By doing this, the five <strong>and</strong> seven membered ring<br />

structure can be restored to the crystalline state. This model was extended to Si (100)<br />

<strong>and</strong> the activat<strong>ion</strong> <strong>energy</strong> for SPER was identified with the sum <strong>of</strong> the <strong>energy</strong> to break a<br />

bond at the interface <strong>and</strong> the increase in distort<strong>ion</strong> <strong>energy</strong> accompanying bond<br />

rearrangement (51). It was suggested that SPER proceeds through the propagat<strong>ion</strong> <strong>of</strong><br />

[110] ledges on {111} planes <strong>and</strong> ledges (53). The <strong>energy</strong> to break every bond was not<br />

required for recrystallisat<strong>ion</strong> to occur. It was found to be possible to make major<br />

readjustments with the breaking <strong>of</strong> just one bond <strong>and</strong> propagating the loose ends<br />

through the structure. The shortcomings <strong>of</strong> this type <strong>of</strong> model are that they do not<br />

account for the differences observed in the SPER rate with implanted group III <strong>and</strong> V<br />

dopant <strong>and</strong> other impurities.<br />

Electric field models based on electronic processes make a much better attempt<br />

to explain the SPER rate dependence on dopant concentrat<strong>ion</strong>. Several different models<br />

exist <strong>and</strong> the crux <strong>of</strong> these arguments is to identify specific defects that give rise to the<br />

bond breaking process. An important model <strong>of</strong> this type extended the models using<br />

crystallisat<strong>ion</strong> along kink sites, to incorporate doping effects (14). It was proposed that<br />

SPER is mediated by the generat<strong>ion</strong> <strong>and</strong> mot<strong>ion</strong> <strong>of</strong> kink like steps along [110] ledges.<br />

Here SPER is viewed as a cooperative process in which the mot<strong>ion</strong> <strong>of</strong> a kink is<br />

accompanied by crystallisat<strong>ion</strong> <strong>of</strong> many atoms before the kink is annihilated. Addit<strong>ion</strong><br />

<strong>of</strong> a doping impurity can either increase the concentrat<strong>ion</strong> <strong>of</strong> charged kinks or reduce<br />

the kink migrat<strong>ion</strong> <strong>energy</strong> <strong>and</strong> enhance the SPER rate. Kinks can be pinned by the<br />

<strong>format<strong>ion</strong></strong> <strong>of</strong> a strong bond between a Si atom <strong>and</strong> an impurity atom. This model is<br />

illustrated in Figure 3.7. This model describes intrinsic as well as doping enhancement.<br />

The growth site <strong>of</strong> this model can be visualised as some bond breaking defect.<br />

Figure 3.7 Schematic representat<strong>ion</strong> <strong>of</strong> SPER <strong>of</strong> Si(100) in terms <strong>of</strong><br />

kink (BB’) generat<strong>ion</strong> <strong>and</strong> mot<strong>ion</strong> along [110] ledges (AA’). From (14).<br />

48

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