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Damage formation and annealing studies of low energy ion implants ...

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oadening <strong>of</strong> the Si peak at the base occurs due to Si isotopes, the system resolut<strong>ion</strong>,<br />

<strong>and</strong> any overlap <strong>of</strong> the Si peak with the dopant peak. This prevented the base <strong>of</strong> the Si<br />

peak from being used as a reference point for alignment. The gradient <strong>of</strong> the leading<br />

edge <strong>of</strong> Si peaks varies between samples, primarily because <strong>of</strong> a dilut<strong>ion</strong> for different<br />

oxide layer widths, causing a marginal error if a set height on the peaks was chosen. The<br />

best point on the spectra to align the peaks to was near the base but above the isotope<br />

tail. Even so there was a lack <strong>of</strong> reproducibility in this method <strong>and</strong> an error, estimated to<br />

be <strong>of</strong> up to 0.2 nm could be introduced.<br />

A fitting routine developed at Daresbury laboratory that attempted to find the<br />

best fit <strong>of</strong> beam <strong>energy</strong> to the peaks was trialled but did not give sufficient reliability to<br />

be used routinely.<br />

Finally it was concluded that the best solut<strong>ion</strong> was to deposit a very small<br />

amount <strong>of</strong> Au onto the surface <strong>of</strong> each sample using a k-cell evaporator. This was used<br />

as a reference to determine the beam <strong>energy</strong>, from the kinematic factor <strong>and</strong> the <strong>energy</strong> at<br />

the centre <strong>of</strong> the Au peak. The presence <strong>of</strong> considerably less than a monolayer <strong>of</strong> Au<br />

would have no appreciable affect on the rest <strong>of</strong> the spectrum. Using the k-cell could<br />

produce a consistent Au layer on each sample. Knowing the beam <strong>energy</strong> accurately for<br />

each sample meant that the relat<strong>ion</strong>ship between the <strong>energy</strong> scale <strong>and</strong> scattering depth<br />

could be calculated, referenced to the actual beam <strong>energy</strong> used for each sample.<br />

4.2.3.3 Numerical solut<strong>ion</strong> to depth scale<br />

In order to utilise the knowledge <strong>of</strong> the beam <strong>energy</strong> a method <strong>of</strong> calculating the<br />

depth scales quickly was needed. A computer program was written to calculate these<br />

depth scales using numerical methods. There are important differences in principle<br />

compared to the surface approximat<strong>ion</strong> method, which uses a fixed rate <strong>of</strong> <strong>energy</strong> loss.<br />

The numerical method calculates the depth scale in a manner which mirrors the actual<br />

situat<strong>ion</strong>. Within the program the instantaneous rate <strong>of</strong> <strong>energy</strong> loss is calculated. The<br />

stopping power is given as a funct<strong>ion</strong> <strong>of</strong> the beam <strong>energy</strong> by a third order polynomial<br />

(given in Figure 4.18) which gives an accurate fit to the values obtained from SRIM.<br />

Given the starting <strong>energy</strong> <strong>of</strong> the incident beam, the instantaneous rate <strong>of</strong> inelastic <strong>energy</strong><br />

loss is calculated. After travelling a fixed distance (set at 0.1 nm), a reduced “beam<br />

<strong>energy</strong>” is calculated from the inelastic <strong>energy</strong> lost, <strong>and</strong> from this “beam <strong>energy</strong>” a new<br />

rate <strong>of</strong> inelastic <strong>energy</strong> loss is determined. From the path length the number <strong>of</strong> repeat<br />

cycles in the calculat<strong>ion</strong>s is determined. Once at the scattering depth, the reduced “beam<br />

<strong>energy</strong>” is multiplied by the kinematic factor, to account for scattering. The same<br />

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