Millimeter-wave high-efficiency multilayer parasitic microstrip antenna
Millimeter-wave high-efficiency multilayer parasitic microstrip antenna
Millimeter-wave high-efficiency multilayer parasitic microstrip antenna
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IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, VOL. 53, NO. 6, JUNE 2005 2101<br />
<strong>Millimeter</strong>-Wave High-Efficiency Multilayer Parasitic<br />
Microstrip Antenna Array on Teflon Substrate<br />
Tomohiro Seki, Member, IEEE, Naoki Honma, Member, IEEE, Kenjiro Nishikawa, Member, IEEE, and<br />
Kouichi Tsunekawa, Member, IEEE<br />
Abstract—This paper proposes a <strong>high</strong>ly efficient <strong>multilayer</strong> <strong>parasitic</strong><br />
<strong>microstrip</strong> <strong>antenna</strong> array that is constructed on a <strong>multilayer</strong><br />
Teflon substrate for millimeter-<strong>wave</strong> system-on-package modules.<br />
The proposed <strong>antenna</strong> achieves a radiation <strong>efficiency</strong> of greater<br />
than 91% and an associated <strong>antenna</strong> gain of 11.1 dBi at 60 GHz.<br />
The <strong>antenna</strong> size is only 10 mm 10 mm. Additionally, this paper<br />
describes a 60-GHz-band prototype <strong>antenna</strong> employing a <strong>multilayer</strong><br />
Teflon substrate that is well suited to achieving <strong>high</strong> gain and<br />
a wide bandwidth. The measured performance of the prototype <strong>antenna</strong><br />
is also presented.<br />
Index Terms—Active integrated <strong>antenna</strong>, broad-band mobile<br />
wireless access, millimeter-<strong>wave</strong> frequency band, <strong>multilayer</strong><br />
Teflon substrate, system-on-package.<br />
I. INTRODUCTION<br />
SYSTEM studies and hardware investigations on <strong>high</strong>-speed<br />
wireless communications are being conducted at millimeter-<strong>wave</strong><br />
and quasi-millimeter-<strong>wave</strong> frequencies [1]–[3].<br />
These applications require compact, <strong>high</strong>-performance, and<br />
low-cost wireless equipment. A <strong>high</strong>ly integrated RF module,<br />
the so-called system-on-package module, which employs a<br />
<strong>multilayer</strong> structure, is effective in achieving the above requirements<br />
[4]–[7]. It is necessary to adopt active integrated<br />
<strong>antenna</strong> technology to achieve a module with <strong>antenna</strong>s that<br />
are low-power consuming and have low-noise characteristics<br />
[8]–[10]. Several approaches to achieve an RF module<br />
that is integrated with <strong>antenna</strong>s were reported. One approach<br />
uses a semiconductor chip <strong>antenna</strong> such as a <strong>microstrip</strong> <strong>antenna</strong><br />
(MSA) that is integrated with RF circuits on the same<br />
semiconductor substrate [4]. However, in this approach, it is<br />
difficult to establish a <strong>high</strong>-gain <strong>antenna</strong> that employs an array<br />
<strong>antenna</strong> configuration on a semiconductor substrate due to the<br />
substrate size. Therefore, <strong>high</strong>-gain compact <strong>antenna</strong>s have<br />
not yet been integrated with monolithic micro<strong>wave</strong> integrated<br />
circuits (MMICs). A multichip-module approach was also<br />
proposed to construct a module integrated with <strong>antenna</strong>s [5],<br />
[6]. In this module, <strong>antenna</strong>s and MMICs are connected by<br />
wire bonding or a ribbon, which results in <strong>high</strong>-connection<br />
loss. This approach also requires a low-loss feeding circuit.<br />
The dielectric lens <strong>antenna</strong> was adopted to achieve a <strong>high</strong>-gain<br />
<strong>antenna</strong> [7]. However, the commonly used lens <strong>antenna</strong> is constructed<br />
using an expensive crystal material and it is difficult<br />
Manuscript received October 1, 2004; revised February 17, 2005.<br />
The authors are with the Nippon Telegraph and Telephone (NTT) Network Innovation<br />
Laboratories, NTT Corporation, Kanagawa 239-0847, Japan (e-mail:<br />
seki.tomohiro@lab.ntt.co.jp; t.seki@ieee.org).<br />
Digital Object Identifier 10.1109/TMTT.2005.848757<br />
0018-9480/$20.00 © 2005 IEEE<br />
to mount it on the MMIC package. Additionally, a dielectric<br />
lens <strong>antenna</strong> constructed using resin was investigated as a<br />
low-cost alternative. There are problems, however, regarding<br />
mounting the <strong>antenna</strong> on the MMIC package and achieving<br />
<strong>high</strong> <strong>efficiency</strong>. Moreover, it is difficult to construct an array<br />
<strong>antenna</strong> substrate on a single layer due to the limitations in<br />
the manufacturing process for the millimeter-<strong>wave</strong> frequency<br />
band. The technique for improving the radiation <strong>efficiency</strong> by<br />
arranging <strong>parasitic</strong> elements above the feeding MSA elements<br />
is examined [11]–[15]. However, obtaining a sufficient absolute<br />
gain is difficult in this study [11]–[14]. This paper investigates<br />
the <strong>high</strong>-gain <strong>antenna</strong> using a low permittivity or the air layer<br />
[15]. However, only the directional gain is described and there<br />
is a problem in that it is difficult to support the <strong>parasitic</strong> element<br />
substrates. In particular, it is difficult to adopt this <strong>antenna</strong><br />
in the system-on-package for the millimeter-<strong>wave</strong> frequency.<br />
To overcome the above problems, we proposed a <strong>multilayer</strong><br />
<strong>parasitic</strong> <strong>microstrip</strong> <strong>antenna</strong> array (MPMAA) structure based<br />
on a <strong>parasitic</strong> <strong>antenna</strong> configuration [11] using a low-temperature<br />
co-fired ceramic substrate (LTCC) suited to packaging<br />
the MMIC chip [16]. However, since the LTCC substrate has a<br />
<strong>high</strong> electric constant, it is difficult to achieve wide-band and<br />
<strong>high</strong>-<strong>efficiency</strong> characteristics.<br />
In this paper, we propose a <strong>high</strong>ly efficient MPMAA structure<br />
constructed on a Teflon substrate for a system-on-package<br />
at millimeter-<strong>wave</strong> frequency bands [17]. At 60 GHz, the new<br />
<strong>antenna</strong> achieves <strong>high</strong> radiation <strong>efficiency</strong> of greater than 91%<br />
and <strong>high</strong> gain that is greater than 11.1 dBi. The remainder of<br />
this paper is as follows. In Section II, we first describe the<br />
system-on-package module and the design of the proposed<br />
<strong>antenna</strong>. In Section III, we present the effect of the alignment<br />
precision due to the manufacturing process. Moreover, in Section<br />
IV, we describe the manufactured prototype <strong>antenna</strong> and<br />
the tests conducted at 60 GHz. We also present characteristics<br />
of the prototype <strong>antenna</strong> and clarify the design method.<br />
II. DESIGN OF PARASITIC ELEMENT ARRANGEMENT<br />
CONSTRUCTED WITH TEFLON SUBSTRATE<br />
A. <strong>Millimeter</strong>-Wave System-on-Package Image<br />
The concept of a system-on-package module integrated with<br />
an <strong>antenna</strong> is shown in Fig. 1. The system-on-package module<br />
has a <strong>high</strong>ly integrated transceiver MMIC mounted on a <strong>multilayer</strong><br />
structure and the proposed MPMAA. The <strong>multilayer</strong> structure<br />
for the MMIC chips and the MPMAA is vertically stacked.<br />
Two types of feeding methods for the MPMAA are considered.<br />
In the first method, a feeding element is constructed on the
2102 IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, VOL. 53, NO. 6, JUNE 2005<br />
Fig. 1. Novel structure of system-on-package integrated with an <strong>antenna</strong>.<br />
Fig. 2. Antenna model.<br />
MMIC chip and the MPMAA is fed by electromagnetic coupling<br />
without a feeding line. In the other, a feeding element is<br />
constructed where the <strong>multilayer</strong> substrate of the MPMAA and<br />
the element is connected to the terminal of the MMIC using<br />
flip-chip technology. As indicated in Fig. 1, the MPMAA employs<br />
two <strong>parasitic</strong> layers. Four <strong>parasitic</strong> elements are arranged<br />
on the first <strong>parasitic</strong> layer, and nine <strong>parasitic</strong> elements are arranged<br />
on the second <strong>parasitic</strong> layer.<br />
B. High-Efficiency Antenna Design<br />
This proposed <strong>antenna</strong> achieves <strong>high</strong> gain because it increases<br />
the <strong>antenna</strong> aperture using the coupling between the layers of<br />
the <strong>multilayer</strong> substrate. The MPMAA design for the 60-GHz<br />
band is described. We use the moment method as the calculation<br />
method and assume that the ground plane is infinite. We adopt<br />
the <strong>multilayer</strong> Teflon substrate ( at<br />
10 GHz) as the <strong>antenna</strong> substrate due to its superior characteristics<br />
such as a <strong>high</strong> gain and wider bandwidth. The simulation<br />
model is shown in Fig. 2. Here, we use the via-fed method for<br />
the feeding method. The size of the feeding element is<br />
and the feeding point is away from the center of<br />
the patch. The size of the <strong>parasitic</strong> elements mounted on the<br />
first <strong>parasitic</strong> layer is and the patch size of the<br />
second <strong>parasitic</strong> layer is . The four <strong>parasitic</strong><br />
elements mounted on the first <strong>parasitic</strong> layer are arranged such<br />
Fig. 3. Relationship between I and P that achieves the maximum absolute<br />
gain.<br />
Fig. 4. Absolute gain and radiation <strong>efficiency</strong> characteristics versus P.<br />
that they are equidistant from the center of the feeding MSA.<br />
For convenience, the width (horizontal direction) is expressed<br />
such that the width of the first <strong>parasitic</strong> layer and that of the<br />
second <strong>parasitic</strong> layer are and , respectively, as shown in<br />
Fig. 2. In addition, and represent the substrate thicknesses<br />
of the first and second <strong>parasitic</strong> layers, respectively. The calculated<br />
maximum absolute gain and the relationship between<br />
and that achieve the maximum value when is varied are<br />
shown in Fig. 3. Here, and are set to 0.25 and 0.55 mm, respectively.<br />
In this figure, it is clear that is proportional to .<br />
The relationship of the maximum absolute gain and the radiation<br />
<strong>efficiency</strong> versus is shown in Fig. 4. Here, the substrate<br />
thickness parameters are the same. In this figure, it is clear that<br />
the maximum absolute gain is 11.1 dBi and that the radiation<br />
<strong>efficiency</strong> is 91%, when is and is . The <strong>antenna</strong><br />
achieves the maximum radiation <strong>efficiency</strong> of 97% when<br />
is . Here, we believe that the peak of the absolute gain<br />
is obtained by increasing the <strong>antenna</strong> aperture according to the<br />
increase in the number of <strong>parasitic</strong> elements and the degradation<br />
in the <strong>efficiency</strong> due to the decrease in the coupling between the<br />
feed element and the <strong>parasitic</strong> elements. Additionally, it is necessary<br />
to clarify the effect of the variation in the substrate thickness<br />
for the <strong>parasitic</strong> elements. The dependency of the absolute
SEKI et al.: MILLIMETER-WAVE HIGH-EFFICIENCY MPMAA ON TEFLON SUBSTRATE 2103<br />
Fig. 5. Absolute gain characteristics versus substrate thicknesses I and P.<br />
Fig. 6. Calculated frequency characteristics of the absolute gain and ƒII.<br />
gain on the substrate thicknesses and is shown in Fig. 5. In<br />
this figure, when and are 0.25 and 0.55 mm, respectively,<br />
the absolute gain is maximum at 11.1 dBi. Additionally, it is<br />
clear that the manufacturing margins of and are approximately<br />
150 m and 100 m, respectively, and the gain reduction<br />
is less than 0.5 dB. Furthermore, it is clear that the precision<br />
of the substrate thickness of the conventional <strong>multilayer</strong> Teflon<br />
substrate process is sufficient to construct the proposed <strong>antenna</strong>.<br />
Fig. 6 shows the frequency characteristics of the proposed <strong>antenna</strong>.<br />
In this figure, it is clear that the bandwidth is 2.6%, when<br />
the characteristics are less than 10 dB. To consider the<br />
mechanism of this <strong>antenna</strong>, the results of the current distribution<br />
calculated using the moment-method analysis are shown in<br />
Fig. 7. Here, Fig. 7(a) shows the front view and Fig. 7(b) shows<br />
the rear view. From Fig. 7(a) and (b), we understand that, in the<br />
feeding element, the current is distributed to the first layer <strong>parasitic</strong><br />
elements, and the current is distributed in the second-layer<br />
<strong>parasitic</strong> elements via the first-layer <strong>parasitic</strong> elements. The RF<br />
signal can be effectively separated from the feeding element and<br />
passed to the second-layer <strong>parasitic</strong> elements without using a<br />
power divider circuit, and the array operation can been achieved.<br />
III. EFFECT OF ALIGNMENT PRECISION<br />
This <strong>antenna</strong> constructed on the <strong>multilayer</strong>ed Teflon substrate<br />
that binds the substrates using the bonding film is sensitive to<br />
the effect of the alignment precision compared to when using<br />
Fig. 7. Current distribution of the proposed <strong>antenna</strong>. (a) Front view. (b) Rear<br />
view.<br />
Fig. 8. Absolute gain reduction versus alignment precision of the - axis<br />
direction.<br />
other substrates such as the alumina–ceramic substrate. It is<br />
necessary to clarify the effect of the alignment error derived<br />
from the binding substrates. Here, we use the moment method<br />
for the calculation method. The size of the feeding element is<br />
and the feeding point is away from the<br />
center of the patch. The size of the <strong>parasitic</strong> elements mounted<br />
on the first <strong>parasitic</strong> layer is and the patch<br />
size of the second <strong>parasitic</strong> layer is . Furthermore,<br />
the position of the first <strong>parasitic</strong> layer is<br />
and the position of the second <strong>parasitic</strong> layer is<br />
. The calculated results of the absolute<br />
gain reduction are shown in Fig. 8 when alignment error occurs
2104 IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, VOL. 53, NO. 6, JUNE 2005<br />
Fig. 9. Absolute gain reduction versus alignment precision of -axis direction.<br />
in the direction of the -axis. The calculated results of the absolute<br />
gain reduction are shown in Fig. 9 when alignment error<br />
occurs in the direction of the -axis. In these figures, it is clear<br />
that the effect of the alignment error in the direction of the -axis<br />
is greater than that in the direction of the -axis. We believe that<br />
the reason for this is that there is a standing <strong>wave</strong> in the direction<br />
of the -axis of each patch. Additionally, it is clear that the<br />
alignment margin of the first layer <strong>parasitic</strong> substrate and that<br />
of the second layer <strong>parasitic</strong> substrate are approximately 100<br />
and 50 m, respectively, and the gain reduction is less than<br />
0.5 dB. Furthermore, it is clear that the alignment precision of<br />
the conventional <strong>multilayer</strong> Teflon substrate process is sufficient<br />
to construct the proposed <strong>antenna</strong>.<br />
IV. MEASURED PERFORMANCE<br />
A. Measurement System<br />
In the millimeter-<strong>wave</strong> frequency range, the measurement deviation<br />
that occurs due to soldering error and the difference in<br />
the connecting torque is an important issue. To eliminate the<br />
deviation, we developed a novel <strong>antenna</strong>-probing fixture based<br />
on an RF on-wafer probing system. As a result, the same accurate<br />
measurement as the MMIC chip measurement becomes<br />
possible in the radiation pattern measurement of the miniaturized<br />
<strong>antenna</strong> in the millimeter-<strong>wave</strong> frequency band. Here, the<br />
millimeter-<strong>wave</strong> radiation pattern measuring system is shown<br />
in Fig. 10. The configuration of the measuring system using an<br />
RF probe and a photograph of the system are shown in Figs. 11<br />
and 12, respectively. These on-wafer probes can be directly connected<br />
to an <strong>antenna</strong> terminal formed on the planar substrate.<br />
This system can measure the <strong>antenna</strong> radiation without the need<br />
to mount RF connectors on the <strong>antenna</strong> substrate. This method<br />
yields <strong>high</strong>er accuracy and <strong>high</strong>er <strong>efficiency</strong>. This fixture can<br />
employ two probe heads. One probe is used to feed the RF signal<br />
to the <strong>antenna</strong> terminal and the other is used to feed the control<br />
signal and dc power to the devices mounted on the <strong>antenna</strong> substrate.<br />
B. Antenna Performance<br />
We manufactured a prototype <strong>antenna</strong> that is constructed<br />
using the Teflon substrate to confirm the design in the 60-GHz<br />
Fig. 10. Antenna pattern measuring system.<br />
Fig. 11. Configuration of measuring system using RF probe.<br />
Fig. 12. Measuring system using RF probe.<br />
band. We use a <strong>microstrip</strong> line and a via-hole to feed the<br />
MSA, which demonstrates the operation of the feeding element<br />
shown in Fig. 2. Two <strong>parasitic</strong> layers are arranged such<br />
that the size and location of the MSA and <strong>parasitic</strong> elements,<br />
substrate thickness, and location of the feeding points achieve
SEKI et al.: MILLIMETER-WAVE HIGH-EFFICIENCY MPMAA ON TEFLON SUBSTRATE 2105<br />
Fig. 13. Prototype <strong>antenna</strong>.<br />
Fig. 14. Measured radiation pattern of i-plane.<br />
the maximum absolute gain, as described in Section IV-B.<br />
A photograph of the prototype <strong>antenna</strong> is shown in Fig. 13.<br />
The figure on the left-hand side shows the side view of the<br />
<strong>antenna</strong> element and the figure on the right-hand side shows<br />
the feeding line. The fabricated prototype <strong>antenna</strong> chip size is<br />
10.0 mm 10.0 mm 1.1 mm. The - and -plane radiation<br />
patterns are shown in Figs. 14 and 15, respectively. In these<br />
figures, the measured and calculated radiation patterns are<br />
fairly equal regarding the main lobe. Next, we describe the<br />
bandwidth of this <strong>antenna</strong>. The frequency characteristics of<br />
the measured maximum gain and the characteristics are<br />
shown in Fig. 16. In this figure, the frequency bandwidth for<br />
the gain that is 3 dB lower than the peak gain for this <strong>antenna</strong><br />
is from 59.3–62.6 GHz. Therefore, the bandwidth compared to<br />
the center frequency is 5.5%. The frequency characteristics<br />
and the gain are in good agreement with the calculated results<br />
shown in Fig. 6. Additionally, we clarify that the estimated<br />
absolute gain is greater than 8.5 dBi because the measured<br />
absolute gain of this <strong>antenna</strong> is greater than 7.4 dBi including<br />
the RF probe loss, which is approximately 1.1 dB at 60 GHz.<br />
The dispersion between the calculated and measured gain is<br />
approximately 3 dB. Here, three causes are considered for this<br />
gain reduction. The first cause is the loss in the <strong>microstrip</strong><br />
line/coplanar line transition. The second cause originates from<br />
a discrepancy in the bonding film thickness in the design<br />
compared to the actual due to the manufacturing process, and<br />
Fig. 15. Measured radiation pattern of r-plane.<br />
Fig. 16. Frequency characteristics of the absolute gain and ƒII.<br />
the third cause is due to the production accuracy in the <strong>antenna</strong><br />
manufacturing. More specifically, the gain reduction because<br />
of the change in the bonding film thickness is 1 dB or more.<br />
In addition, the reduction in the gain in that case is 1 dB or<br />
more, although the alignment accuracy when the <strong>antenna</strong> is<br />
manufactured is approximately 100 m. As a research topic<br />
in the future, we must conduct research on the bonding film<br />
material that has electric characteristics that are similar to the<br />
Teflon substrate. Furthermore, it seems that improving the<br />
alignment binding accuracy of the <strong>multilayer</strong> Teflon substrate<br />
to approximately 50 m is necessary.<br />
V. CONCLUSION<br />
This paper has proposed a <strong>high</strong>ly efficient MPMAA constructed<br />
on a <strong>multilayer</strong> Teflon substrate for millimeter-<strong>wave</strong><br />
system-on-package modules. The design and performance of<br />
the proposed array <strong>antenna</strong> has been described. The proposed<br />
prototype <strong>antenna</strong> employs a <strong>multilayer</strong> Teflon substrate that<br />
is well suited to achieving <strong>high</strong> gain and a wide frequency<br />
bandwidth. This paper has also presented the prototype <strong>antenna</strong><br />
performance such as the return-loss characteristics and<br />
the radiation pattern characteristics in the 60-GHz band. The<br />
radiation <strong>efficiency</strong> of the proposed <strong>antenna</strong> is greater than<br />
91%. Moreover, we demonstrated a prototype <strong>antenna</strong> for the<br />
60-GHz band.
2106 IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, VOL. 53, NO. 6, JUNE 2005<br />
ACKNOWLEDGMENT<br />
The authors thank Dr. M. Umehira and Dr. I. Toyoda, both of<br />
the Nippon Telegraph and Telephone (NTT) Corporation, Kanagawa,<br />
Japan, for their constant encouragement.<br />
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Tomohiro Seki (M’94) was born in Tokyo, Japan, in<br />
1967. He received the B.E. and M.E. degrees in electrical<br />
engineering from the Tokyo University of Science,<br />
Tokyo, Japan, in 1991, and 1993, respectively.<br />
In 1993, he joined the Nippon Telephone and<br />
Telegraph (NTT) Corporation, Kanagawa, Japan,<br />
where he has been engaged in research on planar<br />
<strong>antenna</strong>s and active integrated <strong>antenna</strong>s for the millimeter-<strong>wave</strong><br />
and micro<strong>wave</strong> bands. He is currently<br />
a Research Engineer with the Antenna Research<br />
Group, NTT Network Innovation Laboratories, NTT<br />
Corporation.<br />
Mr. Seki is a member of the Institute of Electronics, Information and Communication<br />
Engineers (IEICE), Japan. He was the recipient of the 1999 Young<br />
Engineer Award presented by the IEICE.<br />
Naoki Honma (M’00) was born in Sendai, Japan, in<br />
1973. He received the B.E., M.E., and Ph.D. degrees<br />
in electrical engineering from Tohoku University,<br />
Sendai, Japan, in 1996, 1998, and 2005, respectively.<br />
In 1998, he joined the Nippon Telegraph and<br />
Telephone (NTT) Radio Communication Systems<br />
Laboratories, NTT Corporation, Kanagawa, Japan.<br />
He is currently with the NTT Network Innovation<br />
Laboratories, NTT Corporation, Kanagawa, Japan.<br />
His current research interest is planar <strong>antenna</strong>s for<br />
<strong>high</strong>-speed wireless communication systems.<br />
Dr. Honma is a member of the Institute of Electronics, Information and Communication<br />
Engineers (IEICE), Japan. He was the recipient of the 2003 Young<br />
Engineers Award presented by the IEICE and the 2003 Asia–Pacific Micro<strong>wave</strong><br />
Conference (APMC) Best Paper Award.<br />
Kenjiro Nishikawa (A’93–M’00) was born in Nara,<br />
Japan, in 1965. He received the B.E. and M.E. degrees<br />
in welding engineering and Dr. Eng. degree in<br />
communication engineering from Osaka University,<br />
Suita, Japan, in 1989, 1991, and 2004, respectively.<br />
In 1991, he joined the Nippon Telegraph and<br />
Telephone (NTT) Radio Communication Systems<br />
Laboratories (now the NTT Network Innovation<br />
Laboratories), NTT Corporation, Kanagawa, Japan,<br />
where he has been engaged in research and development<br />
on three-dimensional (3-D) and uniplanar<br />
monolithic micro<strong>wave</strong> integrated circuits (MMICs) on Si and GaAs and<br />
their applications. He is currently interested in millimeter-<strong>wave</strong> transceivers,<br />
system-in-package technologies, active integrated <strong>antenna</strong>s, and <strong>high</strong>-speed<br />
communication systems.<br />
Dr. Nishikawa is a Technical Program Committee member of the IEEE Compound<br />
Semiconductor Integrated Circuit Symposium and the IEEE Radio and<br />
Wireless Symposium. He is a member of the Institute of Electronics, Information<br />
and Communication Engineers (IEICE), Japan. He was the recipient of the<br />
1996 Young Engineer Award presented by the IEICE.<br />
Kouichi Tsunekawa (M’89) was born in Niigata,<br />
Japan, on January 21, 1958. He received the B.S.,<br />
M.S., and Ph.D. degrees in science engineering from<br />
Tsukuba University, Ibaraki, Japan, in 1981, 1983,<br />
and 1992, respectively.<br />
In 1983, he joined the Nippon Telegraph and<br />
Telephone (NTT) Electrical Communications Laboratories<br />
(ECL), NTT Corporation, Tokyo, Japan.<br />
Since 1984, he has been engaged in the research<br />
and development of portable telephone <strong>antenna</strong>s in<br />
land mobile communication systems. From 1993<br />
to 2003, he was with NTT DoCoMo Incorporation. He is involved with<br />
radio propagation research, intelligent <strong>antenna</strong> systems for wireless communications,<br />
and the development of IMT-2000 <strong>antenna</strong> systems. He is<br />
also currently engaged in the development of IMT-2000 <strong>antenna</strong> systems.<br />
He is currently an Executive Research Engineer with the Wireless Systems<br />
Innovation Laboratory, NTT Network Innovation Laboratories, NTT<br />
Corporation, Kanagawa, Japan.