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JST Vol. 21 (1) Jan. 2013 - Pertanika Journal - Universiti Putra ...

JST Vol. 21 (1) Jan. 2013 - Pertanika Journal - Universiti Putra ...

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Y. Yusuf, J. M. Juoi, Z. M. Rosli, W. L. Kwan and Z. Mahamud<br />

Fig.4: The XRD pattern of microwave plasma nitrided at various process temperatures and times<br />

Microstructures<br />

The SEM micrographs on the cross-sectioned plasma nitride samples revealed that the variation<br />

in the microstructure is visible at the depth of 120 µm (Fig.5). Throughout this depth, 3 distinct<br />

regions with different microstructures were observed. As the process temperature and time<br />

increased, the outermost layer was apparently observed. Underneath this continuous outermost<br />

layer, a distinct layer with lamellar and acicular structures was found to exist. These lamellar<br />

and acicular structures grew bigger with the increase of process temperature. Besides, the<br />

distinct layer was observed broadening with the increase of process time.<br />

50 <strong>Pertanika</strong> J. Sci. & Technol. <strong>21</strong> (1): 283 - 298 (<strong>2013</strong>)

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