Design specific variation in pattern transfer by via/contact etch ...
Design specific variation in pattern transfer by via/contact etch ...
Design specific variation in pattern transfer by via/contact etch ...
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VEB+ - based correlations<br />
x<br />
Normalized Etch Rate<br />
VCE<br />
1.01<br />
1.00<br />
0.99<br />
0.98<br />
0.97<br />
0.96<br />
0.95<br />
0.94<br />
0.93<br />
P=P3 fitt<strong>in</strong>g with theta_0<br />
0.92<br />
VCE4<br />
0 200 400 600 800 1000 1200 1400 1600 1800 2000<br />
1.02<br />
1.00<br />
0.98<br />
0.96<br />
0.94<br />
0.92<br />
Distance x from edge of the large open area [um]<br />
P1=0.005 Torr<br />
P2=0.02<br />
P3=0.05<br />
P4=0.1<br />
VCE1<br />
VCE2<br />
VCE3<br />
y = 1.1734x - 0.1695<br />
R 2 = 0.9262<br />
0.90<br />
0.93 0.94 0.95 0.96 0.97 0.98 0.99 1 1.01<br />
Measurements<br />
VCE1<br />
L<strong>in</strong>ear (VCE1)<br />
Copyright ©2008, Mentor Graphics.<br />
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