Adsorbat-modifiziertes Wachstum ultradünner Seltenerdoxid ... - E-LIB

Wissenschaftliche Beiträge
Publikationen in referierten Journalen
[1] Flege, J. I.; Kaemena, B.; Meyer, A.; Falta, J.; Senanayake, S. D.; Sadowski,
J. T.; Eithiraj, R. D.; Krasovskii, E. E.: Origin of chemical contrast
in low-energy electron reflectivity of correlated multivalent oxides: The
case of ceria. In: Phys. Rev. B (2013). – accepted
[2] Flege, J. I.; Kaemena, B.; Senanayake, S. D.; Höcker, J.; Sadowski,
J. T. ; Falta, J.: Growth mode and oxidation state analysis of individual
cerium oxide islands on Ru(0001). In: Ultramicroscopy 130 (2013), S. 87–93.
DOI: 10.1016/j.ultramic.2013.04.007
[3] Kaemena, B.; Senanayake, S. D.; Meyer, A.; Sadowski, J. T.; Falta, J.;
Flege, J. I.: Growth and morphology of ceria on ruthenium (0001). In: J.
Phys. Chem. C 117 (2013), S. 221–232. DOI: 10.1021/jp3081782
[4] Flege, J. I.; Kaemena, B.; Gevers, S.; Bertram, F.; Wilkens, T.; Bruns,
D.; Bätjer, J.; Schmidt, Th.; Wollschläger, J. ; Falta, J.: Silicate-free
growth of high-quality ultrathin cerium oxide films on Si(111). In: Phys. Rev.
B 84 (2011), S. 235418. DOI: 10.1103/PhysRevB.84.235418
[5] Meyer, A.; Flege, J. I.; Senanayake, S. D.; Kaemena, B.; Rettew,
R. E.; Alamgir, F. M.; Falta, J.: In situ oxidation of ultrathin silver
films on Ni(111). In: IBM J. Res. Dev. 55 (2011), S. 8. DOI:
10.1147/JRD.2011.2157262
[6] Gevers, S.; Flege, J. I.; Kaemena, B.; Bruns, D.; Weisemoeller, T.;
Falta, J.; Wollschläger, J.: Improved epitaxy of ultrathin praseodymia
films on chlorine passivated Si(111) reducing silicate interface formation. In:
App. Phys. Lett. 97 (2010), S. 242901. DOI: 10.1063/1.3525175
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